Mô tả ngắn
Hãng sản xuất: Kruss
Automatic wettability and adhesion analysis of wafers and other round samples
The Wafer configuration of the DSA100 Drop Shape Analyzer is geared towards the automatic, standardized quality control of wafer surfaces and other round samples. The instrument precisely determines the homogeneity of the cleaning of a surface based on the contact angle. It also enables coatings to be characterized, for example by differences in wetting of exposed and unexposed photo varnish.
HỖ TRỢ NHANH
THÔNG TIN SẢN PHẨM
- Specifications
- Applications
- Measuring Methods
- Measuring Results
INSTRUMENT DIMENSIONS
Footprint | 555 mm × 375 mm (W × D) |
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Height | 490 mm |
Weight (without accessories) | 24 kg |
TEMPERATURE MEASUREMENT
Range of temperature measurement | -50 to 400 °C |
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Resolution | 0.1 °C |
Precision | 0.1 °C |
Accuracy | 1/3 DIN B (±0.1 °C at 0 °C to ±0.8 °C at 400 °C) |
Location of temperature measurement | environment air |
External sensor | 2 connectors (PT100) |
POWER SUPPLY
Voltage | 88 to 264 VAC |
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Power consumption | 100 W |
Frequency | 50 to 60 Hz |
SAMPLE DIMENSIONS
Maximum sample size | 320 mm × ∞ × 275 mm (W × D × H) (without axes) |
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Maximum measuring surface | – |
ENVIRONMENT
Operating temperature | 10 to 40 °C |
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Humidity | without condensation |
TEMPERATURE CONTROL
Equipment | – |
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Type of temperature control | – |
Range of temperature control | – |
Maximum sample space | – |
Resolution | – |
Flow-through thermostat | – |
Inert gas | – |
INTERFACES
PC | USB 3.0 |
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HOUSING AND PERIPHERALS
Compartment | test liquids protected against light |
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Needle protection shield | yes |
Camera und optics housing | yes |
Control keyboard | PC keyboard for ADVANCE software operation available (KB20) |
Levelling | yes |
SOFTWARE
Software type | ADVANCE |
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Available software modules | contact angle surface free energy of solids interfacial and surface tension of liquids Adhesion Analysis Remote Control API |
SURFACE FREE ENERGY OF SOLIDS
Available | included |
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Results | surface free energy (SFE) |
Models | equation of state Zisman Fowkes Wu Owens-Wendt-Rabel-Kaelble extended Fowkes acid-base theory |
CAPTIVE BUBBLE
Available | included |
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Results | contact angle (CA) |
Range | 0 to 180° (software-based) |
Resolution | 0.01° (software-based) |
Accuracy | 0.1° (instrument-based) |
Models | conic section polynom circle Young-Laplace height-width |
Type | advancing receding static dynamic tilting (additional accessories may be required) |
SESSILE DROP
Available | included |
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Results | contact angle (CA) |
Range | 0 to 180° (software-based) |
Resolution | 0.01° (software-based) |
Accuracy | 0.1° (instrument-based) |
Models | conic section polynom circle Young-Laplace height-width |
Type | advancing receding static dynamic tilting (additional accessories may be required) |
PENDANT DROP/RISING DROP
Available | included |
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Results | interfacial tension (IFT)/surface tension (SFT) |
Range | 0.01 to 2000 mN/m (software-based) |
Resolution | 0.01 mN/m (software-based) |
Models | Young-Laplace |
Types (Pendant drop/Rising drop) | static, dynamic |
CAMERA SYSTEM (STANDARD)
Type | Camera CF04 |
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Connection | USB 3.0 |
Resolution | 1920 × 1200 px |
Frame rate | 2300 fps |
Dark noise | 7 electrons |
Dynamic range | 73 dB |
ILLUMINATION
Type | high power monochromatic LED |
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Wave length, dominant | 470 nm |
Field of light | 46 mm × 46 mm (D × H) |
OPTICS (STANDARD)
Focus | manual |
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Zoom | 7× zoom, manual |
View angle | ±4° |
Field of view | CF04: 3.9 mm × 3.9 mm to 24.7 mm × 24.7 mm |
Resolution of optics | CF04: 3.1 to 21.7 μm |
CAMERA SYSTEM (OPTIONAL)
Type | High Speed Camera CF06 |
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Connection | USB 3.0 |
Resolution | 640 × 480 px |
Frame rate | 3400 fps |
Dark noise | 10.5 electrons |
Dynamic range | 56.6 dB |
DOSING SYSTEM
Dosing | software-controlled |
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Drop deposition | software-controlled |
Cartridge/syringe (volume) | glass (450 μL), disposable (900 μL) |
Resolution | 0.1 μL |
Speed | 0.02 to 25 µL/s |
STAGES
Control | y-axis: software-controlled z-axis: manual z-axis (optional): software-controlled rotation axis: software-controlled |
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Range | y-axis: 170 mm z-axis manual: 45 mm z-axis software-controlled (optional): 38 mm rotation axis: 360° |
Length | – |
Resolution | y-axis: 10 μm z-axis manual: 16 mm/turn z-axis software-controlled (optional): 10 μm rotation axis: 0.1° |
Accuracy | y-axis: 100 μm z-axis manual: – z-axis software-controlled (optional): 100 μm rotation axis: 1° |
OPTICS (OPTIONAL)
Focus | manual |
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Zoom | 7× zoom, manual |
View angle | ±4° |
Field of view | CF06: 1.7 mm × 1.3 mm to 10.8 mm × 8.1 mm |
Resolution of optics | CF06: 2.5 to 17.8 μm |
DOUBLE PRESSURE DOSING SYSTEM (OPTIONAL)
Drop deposition | software-controlled |
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Cartridge, volume | disposable (1 mL) |
Resolution | 0.1 μL |
Speed | fixed |
TILTING (OPTIONAL)
Types | external tilting table |
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Control | software-controlled |
Range | 0 to 90° |
Resolution | 0.1° |
Accuracy | 1° |
DOUBLE PRESSURE DOSING SYSTEM
Drop deposition | – |
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Cartridge, volume | – |
Resolution | – |
Speed | – |
- Characterization of the cleaning and coating homogeneity of wafers
- Adhesion evaluation between wafer and coating
- Wetting investigation of exposed and unexposed photo varnish
- Ideal for analyzing other round samples, e.g. hard drives or brake disks
- Contact angle of a drop on a solid surface
- Contact angles of two drops dosed in parallel
- Automated position-dependent contact angle measurement and evaluation
- Contact angle using a gas bubble beneath a solid surface in a liquid
- Surface free energy of a solid using contact angle data
- Surface tension using the curvature of a perfectly symmetrical drop on a circular sample pedestal
- Roll-off behavior and advancing/receding contact angle of a drop on a tilted surface
- Carrying out a measurement up to 20 consecutive times and displaying the results together
- Remote control of ADVANCE for integration in custom-designed, complex automations
- Static contact angle
- Advancing and receding contact angle
- Contact angle using a bubble in a liquid
- Surface free energy (SFE) according to the following models: Owens-Wendt-Rabel-Kaelble (OWRK), Fowkes, Extended Fowkes, Van Oss & Good (Acid-Base), Schultz, Wu, Zisman, Equation of State
- Position-dependent contact angle and SFE
- Temperature